Ultrafast Coulomb-Induced Intervalley Coupling in Atomically Thin WS2-Reference-Cited by-同舟云学术

Ultrafast Coulomb-Induced Intervalley Coupling in Atomically Thin WS2

Published:2016-04-25 Issue:5 Volume:16 Page:2945-2950
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Schmidt Robert¹,Berghäuser Gunnar²,Schneider Robert¹,Selig Malte³,Tonndorf Philipp¹,Malić Ermin²,Knorr Andreas³,Michaelis de Vasconcellos Steffen¹,Bratschitsch Rudolf¹

Affiliation:

1. Institute of Physics and Center for Nanotechnology, University of Münster, 48149 Münster, Germany

2. Department for Applied Physics, Chalmers University of Technology, SE-41296, Gothenburg, Sweden

3. Department for Theoretical Physics, Technical University Berlin, 10623 Berlin, Germany

Funder

Deutsche Forschungsgemeinschaft

Seventh Framework Programme

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.nanolett.5b04733

Reference48 articles.

1. The rise of graphene

2. Atomically ThinMoS2: A New Direct-Gap Semiconductor

3. Emerging Photoluminescence in Monolayer MoS2

4. Solar-energy conversion and light emission in an atomic monolayer p–n diode

5. Optoelectronic devices based on electrically tunable p–n diodes in a monolayer dichalcogenide

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