Stacking-Dependent Interlayer Coupling in Trilayer MoS2 with Broken Inversion Symmetry

Author:

Yan Jiaxu1,Xia Juan1,Wang Xingli2,Liu Lei3,Kuo Jer-Lai4,Tay Beng Kang2,Chen Shoushun5,Zhou Wu6,Liu Zheng27,Shen Ze Xiang18

Affiliation:

1. Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore 637371, Singapore

2. NOVITAS, Nanoelectronics Centre of Excellence, School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore 639798, Singapore

3. State Key Laboratory of Luminescence and Applications, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, P. R. China

4. Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 10617, Taiwan

5. School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore 639798, Singapore

6. Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States

7. School of Materials Science and Engineering, Nanyang Technological University, Singapore 639798, Singapore

8. Centre for Disruptive Photonic Technologies, Nanyang Technological University, Singapore 637371, Singapore

Funder

Nanyang Technological University

Agency for Science, Technology and Research

Ministry of Education - Singapore

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

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