Robust Interlayer Exciton in WS2/MoSe2 van der Waals Heterostructure under High Pressure

Author:

Ma Xiaoli1ORCID,Fu Shaohua2,Ding Jianwei34,Liu Meng5,Bian Ang2,Hong Fang146,Sun Jiatao5,Zhang Xiaoxian2ORCID,Yu Xiaohui146ORCID,He Dawei2

Affiliation:

1. Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China

2. Key Laboratory of Luminescence and Optical Information, Ministry of Education, Institute of Optoelectronic Technology, Beijing Jiaotong University, Beijing 100044, China

3. CAS Key Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing 100190, China

4. University of Chinese Academy of Sciences, Beijing 100049, China

5. School of Information and Electronics, MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices, Beijing Institute of Technology, Beijing 100081, China

6. Songshan Lake Materials Laboratory, Dongguan, Guangdong 523808, China

Funder

National Natural Science Foundation of China

Youth Innovation Promotion Association of Chinese Academy of Sciences

Strategic Priority Research Program and Key Research Program of Frontier Sciences of the Chinese Academy of Sciences

National Key Research and Development Program of China

Beijing Natural Science Foundation

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

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