Observation of Diffusion and Drift of the Negative Trions in Monolayer WS2

Author:

Cheng Guanghui123ORCID,Li Baikui4ORCID,Jin Zijing1,Zhang Meng4,Wang Jiannong1ORCID

Affiliation:

1. Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong

2. Department of Physics and Astronomy, Purdue Quantum Science and Engineering Institute, Purdue University, West Lafayette, Indiana 47907, United States

3. WPI Advanced Institute for Materials Research (AIMR), Tohoku University, Sendai 980-8577, Japan

4. Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen, Guangdong 518060, China

Funder

Research Grants Council, University Grants Committee

Science, Technology and Innovation Commission of Shenzhen Municipality

National Natural Science Foundation of China

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

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