A Universal Approach to Determine the Atomic Layer Numbers in Two-Dimensional Materials Using Dark-Field Optical Contrast-Reference-Cited by-同舟云学术

A Universal Approach to Determine the Atomic Layer Numbers in Two-Dimensional Materials Using Dark-Field Optical Contrast

Published:2023-07-26 Issue:19 Volume:23 Page:9170-9177
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Zhang Baoqing¹,Zhang Zihao¹,Han Hecheng¹,Ling Haotian¹,Zhang Xijian¹,Wang Yiming¹,Wang Qingpu¹,Li Hu¹^ORCID,Zhang Yifei¹^ORCID,Zhang Jiawei¹²,Song Aimin¹³^ORCID

Affiliation:

1. Shandong Technology Center of Nanodevices and Integration, School of Microelectronics, Shandong University, Jinan, 250100, China

2. Suzhou Research Institute, Shandong University, Suzhou, 215123, China

3. Department of Electrical and Electronic Engineering, University of Manchester, Manchester, M13 9PL, United Kingdom

Funder

Royal Society

National Key Research and Development Program of China

Natural Science Foundation of Jiangsu Province

National Natural Science Foundation of China

Natural Science Foundation of Shandong Province

Key Technology Research and Development Program of Shandong

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.nanolett.3c01722

Reference46 articles.

1. Van der Waals heterostructures

2. Two-dimensional atomic crystals

3. Electric Field Effect in Atomically Thin Carbon Films

4. Two-dimensional gas of massless Dirac fermions in graphene

5. Vertical MoS2 transistors with sub-1-nm gate lengths

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