Pattern Formation in Dewetting Poly(tert-butyl acrylate)/Polyhedral Oligomeric Silsesquioxane (POSS) Bilayer Films-Reference-Cited by-同舟云学术

Pattern Formation in Dewetting Poly(tert-butyl acrylate)/Polyhedral Oligomeric Silsesquioxane (POSS) Bilayer Films

Published:2006-07-11 Issue:16 Volume:22 Page:6734-6738
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Paul Rituparna¹,Esker Alan R.¹

Affiliation:

1. Macromolecules and Interfaces Institute and the Department of Chemistry (0212), Virginia Polytechnic Institute and State University, Blacksburg, Virginia 24061

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la060973y

Reference43 articles.

1. Organic polymeric thin-film transistors fabricated by selective dewetting

2. Nucleated dewetting of thin polymer films

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