Chemical Reaction Studies in CH4/Ar and CH4/N2 Gas Mixtures of a Dielectric Barrier Discharge-Reference-Cited by-同舟云学术

Chemical Reaction Studies in CH4/Ar and CH4/N2 Gas Mixtures of a Dielectric Barrier Discharge

Published:2005-09-28 Issue:41 Volume:109 Page:9371-9377
ISSN:1089-5639
Container-title:The Journal of Physical Chemistry A
language:en
Short-container-title:J. Phys. Chem. A

Author:

Majumdar Abhijit,Behnke Jürgen F.,Hippler Rainer,Matyash Konstantin,Schneider Ralf

Publisher

American Chemical Society (ACS)

Subject

Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp053588a

Reference20 articles.

1. Kogelschatz, U.; Salge, J. InLow-Pressure Plsma Physics; Hippler, R., Pfau, S., Schmidt, M., Schoenbach, K. H., Eds.; Wiley-VCH: New York, 2001, p 331.

2. Basner, R.; Foest, R.; Schmidt, M.; Hempel, F.; Becker, K.Proceedings ofXXIII International Conference on Phenomena in Ionized Gases,Toulouse, France, July 17−22, 1997, Vol IV, p 196, 1997. Basner, R.; Foest, R.; Schmidt, M.; Hempel, F.; Becker, K.Gaseous Dielectric; Christophotou, L. G., James, D. R., Eds., Plenum: New York, 1998; Vol. VIII, p 161.

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