Vapor Pressure Measurements of Sc(tmhd)3 and Synthesis of Stabilized Zirconia Thin Films by Hybrid CVD Technique Using Sc(tmhd)3, Zr(tmhd)4, and Al(acac)3 [tmhd, 2,2,6,6-tetramethyl-3,5-heptanedione; acac, 2,4-pentanedione] as Precursors-Reference-Cited by-同舟云学术

Vapor Pressure Measurements of Sc(tmhd)3 and Synthesis of Stabilized Zirconia Thin Films by Hybrid CVD Technique Using Sc(tmhd)3, Zr(tmhd)4, and Al(acac)3 [tmhd, 2,2,6,6-tetramethyl-3,5-heptanedione; acac, 2,4-pentanedione] as Precursors

Published:2009-10-13 Issue:44 Volume:113 Page:19011-19020
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Selvakumar Jayapragasam¹,Raghunathan Vinjamoor Seshadri¹,Nagaraja Karachalacheruvu Seetharamaiah¹

Affiliation:

1. Department of Chemistry, Loyola Institute of Frontier Energy, Loyola College, Chennai 600 034, India, and School of Engineering Sciences and Technology, University of Hyderabad, Hyderabad 500 046, India

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp906204c

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