Design of Combinatorial Shadow Masks for Complete Ternary-Phase Diagramming of Solid State Materials-Reference-Cited by-同舟云学术

Design of Combinatorial Shadow Masks for Complete Ternary-Phase Diagramming of Solid State Materials

Published:2003-11-13 Issue:1 Volume:6 Page:50-53
ISSN:1520-4766
Container-title:Journal of Combinatorial Chemistry
language:en
Short-container-title:J. Comb. Chem.

Author:

Takahashi R.¹,Kubota H.¹,Murakami M.¹,Yamamoto Y.¹,Matsumoto Y.¹,Koinuma H.¹

Affiliation:

1. Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuda-tyo, Midori-ku, Yokohama 226-8502, Japan, National Institute of Material Science, 1-1 Namiki, Tsukuba, Ibaragi, Japan, Frontier Collaborative Research Center, Tokyo Institute of Technology, Yokohama 226-8503, Japan, and CREST, Japan Science and Technology Corporation, Japan

Publisher

American Chemical Society (ACS)

Subject

General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cc030038i

Reference14 articles.

1. A Combinatorial Approach to Materials Discovery

2. Combinatorial Laser Molecular Beam Epitaxy (MBE) Growth of Mg-Zn-O Alloy for Band Gap Engineering

3. Rapid construction of a phase diagram of doped Mott insulators with a composition-spread approach

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