Avoiding Desiccation Cracks during the Formation of Multilayer Graphene Oxide Films-Reference-Cited by-同舟云学术

Avoiding Desiccation Cracks during the Formation of Multilayer Graphene Oxide Films

Published:2022-09-12 Issue:1 Volume:1 Page:140-151
ISSN:2771-9545
Container-title:ACS Applied Engineering Materials
language:en
Short-container-title:ACS Appl. Eng. Mater.

Author:

H S Vishwanath¹²,Chandrasekhar Gurumurthy Sangam³^ORCID,Mundinamani Shridhar¹²^ORCID

Affiliation:

1. Device Lab, Department of Physics, Siddaganga Institute of Technology, Tumakuru, Karnataka 572103, India

2. Visvesvaraya Technological University, Belagavi 590018, India

3. Nanomaterials and Polymer Physics Lab, Department of Physics, Manipal Institute of Technology, Manipal Academy of Higher Education, Manipal, Karnataka 576104, India

Funder

Vision Group on Science and Technology

Karnataka Council for Technological Upgradation, Government of Karnataka, Karnataka

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acsaenm.2c00027

Reference46 articles.

1. Graphenes prepared by Staudenmaier, Hofmann and Hummers methods with consequent thermal exfoliation exhibit very different electrochemical properties

2. Brodie's or Hummers’ Method: Oxidation Conditions Determine the Structure of Graphene Oxide

3. Large Area, Multilayer Graphene Films as a Flexible Electronic Material

4. High-efficient Synthesis of Graphene Oxide Based on Improved Hummers Method

5. An overview of industrial scalable production of graphene oxide and analytical approaches for synthesis and characterization

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