Modification of Weak Localization in Metallic Thin Films Due to the Adsorption of Chiral Molecules

Author:

Ozeri Meital1,Xu Jiahui2,Bauer Gilad3,Olde Olthof Linde A. B.2,Kimbell Graham2ORCID,Wittmann Angela4ORCID,Yochelis Shira3,Fransson Jonas5ORCID,Robinson Jason W. A.2,Paltiel Yossi3ORCID,Millo Oded1ORCID

Affiliation:

1. Racah Institute of Physics and the Center for Nanoscience and Nanotechnology, The Hebrew University of Jerusalem, Jerusalem 9190401, Israel

2. Department of Materials Science & Metallurgy, University of Cambridge, 27 Charles Babbage Road, Cambridge CB3 0FS, United Kingdom

3. Applied Physics Department and the Center for Nanoscience and Nanotechnology, The Hebrew University of Jerusalem, Jerusalem 9190401, Israel

4. Institute of Physics, Johannes Gutenberg University Mainz, Staudingerweg 7, Mainz 55128, Germany

5. Department of Physics and Astronomy, Uppsala University, Box 516, Uppsala 75120, Sweden

Funder

Engineering and Physical Sciences Research Council

Carl-Zeiss-Stiftung

Israel Science Foundation

Deutsche Forschungsgemeinschaft

Hebrew University of Jerusalem

Harry de Jur Chair in Applied Science

Publisher

American Chemical Society (ACS)

Subject

General Materials Science,Physical and Theoretical Chemistry

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