Secondary Electron Cloaking with Broadband Plasmonic Resonant Absorbers
Author:
Affiliation:
1. Faculty of Engineering, Bar-Ilan University, Ramat-Gan 52900, Israel
2. Bar-Ilan Institute for Nanotechnology & Advanced Materials, Ramat-Gan 52900, Israel
3. Department of Chemistry, Bar-Ilan University, Ramat-Gan 52900, Israel
Funder
German-Israeli Foundation for Scientific Research and Development
Publisher
American Chemical Society (ACS)
Subject
General Materials Science,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpclett.7b00869
Reference30 articles.
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4. Plasmonic excitation and manipulation with an electron beam
5. Optical Properties of Single Plasmonic Holes Probed with Local Electron Beam Excitation
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