Solution-Deposited F:SnO2/TiO2 as a Base-Stable Protective Layer and Antireflective Coating for Microtextured Buried-Junction H2-evolving Si Photocathodes-Reference-Cited by-同舟云学术

Solution-Deposited F:SnO2/TiO2 as a Base-Stable Protective Layer and Antireflective Coating for Microtextured Buried-Junction H2-evolving Si Photocathodes

Published:2014-12-15 Issue:24 Volume:6 Page:22830-22837
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Kast Matthew G.¹,Enman Lisa J.¹,Gurnon Nicholas J.¹,Nadarajah Athavan¹,Boettcher Shannon W.¹

Affiliation:

1. Department of Chemistry and Biochemistry, University of Oregon, Eugene, Oregon 97403, United States

Funder

Division of Chemistry

Research Corporation for Science Advancement

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/am506999p

Reference45 articles.

1. An analysis of the optimal band gaps of light absorbers in integrated tandem photoelectrochemical water-splitting systems

2. Activity–Stability Trends for the Oxygen Evolution Reaction on Monometallic Oxides in Acidic Environments

3. Benchmarking Heterogeneous Electrocatalysts for the Oxygen Evolution Reaction

4. Solution-Cast Metal Oxide Thin Film Electrocatalysts for Oxygen Evolution

5. Prospects for alkaline zero gap water electrolysers for hydrogen production

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