Selective Formation of C2 Compounds from Electrochemical Reduction of CO2 at a Series of Copper Single Crystal Electrodes
Author:
Affiliation:
1. Department of Applied Chemistry, Faculty of Engineering, Chiba University, Inage-ku, Chiba 263-8522, Japan
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp013478d
Reference25 articles.
1. PRODUCTION OF CO AND CH4IN ELECTROCHEMICAL REDUCTION OF CO2AT METAL ELECTRODES IN AQUEOUS HYDROGENCARBONATE SOLUTION
2. PRODUCTION OF METHANE AND ETHYLENE IN ELECTROCHEMICAL REDUCTION OF CARBON DIOXIDE AT COPPER ELECTRODE IN AQUEOUS HYDROGENCARBONATE SOLUTION
3. Efficient High Rate Carbon Dioxide Reduction to Methane and Ethylene at in situ Electrodeposited Copper Electrode
4. Carbon dioxide reduction at low temperature on various metal electrodes
Cited by 568 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Mechanism of biochar-Cu-based catalysts construction and its electrochemical CO2 reduction performance;Carbon Capture Science & Technology;2024-12
2. Electrochemical Biomass Depolymerization: Will Complex Catalysts Trigger High Product Selectivity?;Chemistry of Materials;2024-09-12
3. Multiscale Modeling of CO2 Electrochemical Reduction on Copper Electrocatalysts: A Review of Advancements, Challenges, and Future Directions;ChemSusChem;2024-09-06
4. Recent Advances on CO2 Electrochemical Reduction over Cu‐Based Nanocrystals;ChemCatChem;2024-09-04
5. Recent advances in copper-based catalysts for electrocatalytic CO 2 reduction toward multi-carbon products;Nano Research Energy;2024-09
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3