Deposition of N-Heterocyclic Carbenes on Reactive Metal Substrates─Applications in Area-Selective Atomic Layer Deposition-Reference-Cited by-同舟云学术

Deposition of N-Heterocyclic Carbenes on Reactive Metal Substrates─Applications in Area-Selective Atomic Layer Deposition

Published:2024-05-28 Issue:11 Volume:36 Page:5500-5507
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Lomax Justin T.¹²,Goodwin Eden³²,Aloisio Mark D.⁴²,Veinot Alex J.⁴²,Singh Ishwar⁴²,Shiu Wai-Tung¹²,Bakiro Maram³²,Bentley Jordan³²,DeJesus Joseph F.⁴,Gordon Peter G.³,Liu Lijia¹²⁵^ORCID,Barry Seán T.³²^ORCID,Crudden Cathleen M.⁴²^ORCID,Ragogna Paul J.¹²⁵^ORCID

Affiliation:

1. Department of Chemistry, University of Western Ontario, 1151 Richmond St, London, ON N6A 3K7, Canada

2. Carbon to Metal Coating Institute (C2MCI), Queen’s University, Kingston, Ontario K7L 4 V1, Canada

3. Department of Chemistry, Carleton University, 1125 Colonel By Drive, Ottawa, ON K1S 5B6, Canada

4. Department of Chemistry, Queen’s University, 90 Bader Lane, Kingston, ON K7L 3N6, Canada

5. Surface Science Western, 999 Collip Cir, London, ON N6G 0J3, Canada

Funder

Carleton University

Western University

Semiconductor Research Corporation

Natural Sciences and Engineering Research Council of Canada

Queen's University

New Frontiers in Research Fund

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.4c00412

Reference68 articles.

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4. The gold–sulfur interface at the nanoscale

5. Steric effects of phosphorus ligands in organometallic chemistry and homogeneous catalysis

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