Area-Selective Atomic Layer Deposition of In2O3:H Using a μ-Plasma Printer for Local Area Activation-Reference-Cited by-同舟云学术

Area-Selective Atomic Layer Deposition of In2O3:H Using a μ-Plasma Printer for Local Area Activation

Published:2017-01-31 Issue:3 Volume:29 Page:921-925
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Mameli Alfredo¹^ORCID,Kuang Yinghuan¹,Aghaee Morteza¹,Ande Chaitanya K.¹^ORCID,Karasulu Bora¹,Creatore Mariadriana¹,Mackus Adriaan J. M.¹,Kessels Wilhelmus M. M.¹,Roozeboom Fred¹²

Affiliation:

1. Department of Applied Physics, Eindhoven University of Technology, PO Box 513, 5600 MB Eindhoven, The Netherlands

2. Department Thin Film Technology, TNO, High Tech Campus 21, 5656 AE Eindhoven, The Netherlands

Funder

Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

http://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.6b04469

Reference38 articles.

1. Nanopatterning materials using area selective atomic layer deposition in conjunction with thermochemical surface modification via heated AFM cantilever probe lithography

2. The use of atomic layer deposition in advanced nanopatterning

3. Atomic Layer Deposition of Ni Thin Films and Application to Area-Selective Deposition

4. A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation

5. Area-Selective ALD of Titanium Dioxide Using Lithographically Defined Poly(methyl methacrylate) Films

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