Suppression of Surface Roughening during Ion Bombardment of Semiconductors-Reference-Cited by-同舟云学术

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Suppression of Surface Roughening during Ion Bombardment of Semiconductors

Published:2022-09-29 Issue:19 Volume:34 Page:8968-8974
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Scott John A.¹²,Bishop James¹^ORCID,Toth Milos¹²^ORCID

Affiliation:

1. School of Mathematical and Physical Sciences, University of Technology Sydney, Ultimo, New South Wales 2007, Australia

2. ARC Centre of Excellence for Transformative Meta-Optical Systems, University of Technology Sydney, Ultimo, New South Wales 2007, Australia

Funder

Thermo Fisher Scientific

Australian Research Council

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.2c02391

Reference44 articles.

1. Ion and electron irradiation-induced effects in nanostructured materials

2. Nuclei of the Pt(111) network reconstruction created by single ion impacts

3. Ion-beam induced amorphization and dynamic epitaxial recrystallization in α-quartz

4. Nanostructuring surfaces by ion sputtering

5. Ion-beam-induced amorphization and recrystallization in silicon

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