Tunable Sulfur Incorporation into Atomic Layer Deposition Films Using Solution Anion Exchange-Reference-Cited by-同舟云学术

Tunable Sulfur Incorporation into Atomic Layer Deposition Films Using Solution Anion Exchange

Published:2023-03-17 Issue:6 Volume:35 Page:2503-2517
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Lenef Julia D.¹,Gayle Andrew J.²,Jo Jaesung³,Fuelling Kalyn M.¹,Yadavalli Srinivas K.²,Ortiz-Ortiz Alondra M.²,Sun Kai¹^ORCID,Peterson Rebecca L.¹³^ORCID,Dasgupta Neil P.¹²^ORCID

Affiliation:

1. Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109, United States

2. Department of Mechanical Engineering, University of Michigan, Ann Arbor, Michigan 48109, United States

3. Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109, United States

Funder

Division of Graduate Education

Intel Corporation

Division of Civil, Mechanical and Manufacturing Innovation

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.2c03773

Reference72 articles.

1. Copper Sulfide (Cu x S) Nanowire‐in‐Carbon Composites Formed from Direct Sulfurization of the Metal‐Organic Framework HKUST‐1 and Their Use as Li‐Ion Battery Cathodes

2. Gallium Sulfide-Single-Walled Carbon Nanotube Composites: High-Performance Anodes for Lithium-Ion Batteries

3. A highly stable CuS and CuS–Pt modified Cu2O/CuO heterostructure as an efficient photocathode for the hydrogen evolution reaction

4. Metal Sulfide‐Decorated Carbon Sponge as a Highly Efficient Electrocatalyst and Absorbant for Polysulfide in High‐Loading Li 2 S Batteries

5. Copper sulfide derived nanoparticles supported on carbon for the electrochemical reduction of carbon dioxide

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