Improved Stability of Atomic Layer Deposited Amorphous TiO2 Photoelectrode Coatings by Thermally Induced Oxygen Defects
Author:
Affiliation:
1. Surface Science Group, Laboratory of Photonics, Tampere University of Technology, P.O. Box 692, FI-33101 Tampere, Finland
2. Materials Science, Tampere University of Technology, P.O. Box 589, FI-33101 Tampere, Finland
Funder
Tampereen Teknillinen Yliopisto
Jenny ja Antti Wihurin Rahasto
Suomen Akatemia
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
http://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.7b02938
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5. Oxygen vacancy and hole conduction in amorphous TiO2
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