Screening Aluminum-Based Compounds as Low-κ Dielectrics for High-Frequency Applications

Author:

Morgan Emily E.1ORCID,Zohar Arava1ORCID,Lipkin Sophia2,Monserrat Bartomeu3ORCID,Vaidyanathan Subramanian4,Loeffler Daniel4,Zhang Rui5,Schierle-Arndt Kerstin4,Cheetham Anthony K.16ORCID,Seshadri Ram12ORCID

Affiliation:

1. Materials Department and Materials Research Laboratory, University of California, Santa Barbara, California 93106, United States

2. Department of Chemistry and Biochemistry, University of California, Santa Barbara, California 93106, United States

3. Department of Materials Science and Metallurgy and Cavendish Laboratory, University of Cambridge, Cambridge CB3 0FS, U.K.

4. BASF SE, Ludwigshafen am Rhein 67056, Germany

5. California Research Alliance (CARA) BASF Corporation, Berkeley, California 94720, United States

6. Department of Materials Science and Engineering National, University of Singapore, Singapore 117575, Singapore

Funder

UK Research and Innovation

BASF

Ras Al Khaimah Center for Advanced Materials

University of California, Santa Barbara

University of Cambridge

National Science Foundation

Publisher

American Chemical Society (ACS)

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