Tunable Atomic Layer Deposition into Ultra-High-Aspect-Ratio (>60000:1) Aerogel Monoliths Enabled by Transport Modeling-Reference-Cited by-同舟云学术

Tunable Atomic Layer Deposition into Ultra-High-Aspect-Ratio (>60000:1) Aerogel Monoliths Enabled by Transport Modeling

Published:2021-07-09 Issue:14 Volume:33 Page:5572-5583
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Gayle Andrew J.¹,Berquist Zachary J.²,Chen Yuxin¹,Hill Alexander J.²,Hoffman Jacob Y.²,Bielinski Ashley R.¹,Lenert Andrej²^ORCID,Dasgupta Neil P.¹³^ORCID

Affiliation:

1. Department of Mechanical Engineering, University of Michigan, Ann Arbor, Michigan 48109, United States

2. Department of Chemical Engineering, University of Michigan, Ann Arbor, Michigan 48109, United States

3. Department of Materials Science and Engineering, University of Michigan, Ann Arbor, Michigan 48109, United States

Funder

University of Michigan

National Science Foundation

U.S. Department of Energy

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.1c00770

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