Comparison of Three Isoelectronic Multiple-Well Reaction Systems: OH + CH2O, OH + CH2CH2, and OH + CH2NH
Author:
Affiliation:
1. Department of Atmospheric, Ocean, and Space Sciences, The University of Michigan, Ann Arbor, Michigan 48109-2143, United States
Funder
Division of Atmospheric and Geospace Sciences
National Aeronautics and Space Administration
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpca.5b00910
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