Benzyl Radical Photodissociation Dynamics at 248 nm
Author:
Affiliation:
1. Chemical Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States
2. Department of Chemistry, University of California, Berkeley, California 94720, United States
Funder
Basic Energy Sciences
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpca.5b07125
Reference64 articles.
1. Theoretical study of benzyl radical reactivity in combustion systems
2. High Pressure Pyrolysis of Toluene. 2. Modeling Benzyl Decomposition and Formation of Soot Precursors
3. Toxicology of soot
4. Reaction mechanisms for toluene pyrolysis
5. Experimental and Kinetic Modeling Evidences of a C7H6 Pathway in a Rich Toluene Flame
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