Photolysis of Nitric Acid at 308 nm in the Absence and in the Presence of Water Vapor-Reference-Cited by-同舟云学术

Photolysis of Nitric Acid at 308 nm in the Absence and in the Presence of Water Vapor

Published:2015-05-04 Issue:20 Volume:119 Page:4907-4914
ISSN:1089-5639
Container-title:The Journal of Physical Chemistry A
language:en
Short-container-title:J. Phys. Chem. A

Author:

Zhu Lei¹,Sangwan Manuvesh¹,Huang Li¹,Du Juan¹,Chu Liang T.¹

Affiliation:

1. Wadsworth Center, New York State Department of Health, Department of Environmental Health Sciences, SUNY-Albany, Albany, New York 12201, United States

Funder

Division of Atmospheric and Geospace Sciences

Publisher

American Chemical Society (ACS)

Subject

Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpca.5b00951

Reference63 articles.

1. Daytime formation of nitrous acid: A major source of OH radicals in a forest

2. A comparison of CMAQ HONO predictions with observations from the Northeast Oxidant and Particle Study

3. Nitric acid photolysis on surfaces in low-NOxenvironments: Significant atmospheric implications

4. Summertime nitrous acid chemistry in the atmospheric boundary layer at a rural site in New York State

5. Photochemical production of nitrous acid on glass sample manifold surface

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2. Reactivity of Undissociated Molecular Nitric Acid at the Air–Water Interface;Journal of the American Chemical Society;2020-12-23

3. Reply to the ‘Comment on “Investigations on HONO formation from photolysis of adsorbed HNO3 on quartz glass surfaces”’ by M. N. Sullivan, L. T. Chu and L. Zhu, Phys. Chem. Chem. Phys., 2018, 20, DOI: 10.1039/C8CP04497J;Physical Chemistry Chemical Physics;2018

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5. Investigations on HONO formation from photolysis of adsorbed HNO3 on quartz glass surfaces;Physical Chemistry Chemical Physics;2016