Effect of Alkyl Group on MxOy– + ROH (M = Mo, W; R = Me, Et) Reaction Rates
Author:
Affiliation:
1. Department of Chemistry, Indiana University, 800 East Kirkwood Avenue, Bloomington, Indiana 47405, United States
2. Department of Chemistry, SUNY Stony Brook, Stony Brook, New York 11794-3400, United States
Funder
U.S. Department of Energy
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpca.6b00102
Reference63 articles.
1. Smart Glass and Its Potential in Energy Savings
2. Facile one-step deposition of electrochromic WO3·0.33H2O films on ITO substrate under solvothermal condition
3. Graphene nanosheets-tungsten oxides composite for supercapacitor electrode
4. Transition Metal Oxides as DMFC Cathodes Without Platinum
5. Optoelectronic properties of three dimensional WO3 nanoshale and its application for UV sensing
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