Low-Energy Electron-Induced Processes in Fluorinated Copper Phthalocyanine Films Observed by F- Desorption: Why So Little Damage?-Reference-Cited by-同舟云学术

Low-Energy Electron-Induced Processes in Fluorinated Copper Phthalocyanine Films Observed by F- Desorption: Why So Little Damage?

Published:2007-11-07 Issue:49 Volume:111 Page:12427-12433
ISSN:1089-5639
Container-title:The Journal of Physical Chemistry A
language:en
Short-container-title:J. Phys. Chem. A

Author:

Menzel D.¹,Cloutier P.¹,Sanche L.¹,Madey T. E.¹

Affiliation:

1. Physik Department E20, Technische Universitaet Muenchen, D-85748 Garching, Germany, and Fritz-Haber-Institut der MPG, Department CP, Faradayweg 4-6, 14195 Berlin, Germany, Group in the Radiation Sciences, Faculté de Médecine, Université de Sherbrooke, 3001 12e avenue Nord, Sherbrooke, Quebec, Canada J1H 5N4, Department of Physics and Astronomy and Laboratory for Surface Modification, Rutgers, The State University of New Jersey, 136 Frelinghuysen Road, Piscataway, New Jersey 08854

Publisher

American Chemical Society (ACS)

Subject

Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp074269h

Reference36 articles.

1. The Physical Chemistry of Organic Field-Effect Transistors

2. A soluble and air-stable organic semiconductor with high electron mobility

3. New Air-Stable n-Channel Organic Thin Film Transistors

4. Electronic structure and electrical properties of interfaces between metals and ?-conjugated molecular films

5. Contact resistance in organic transistors that use source and drain electrodes formed by soft contact lamination

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electronically induced surface reactions: Evolution, concepts, and perspectives;The Journal of Chemical Physics;2012-09-07