Detecting 20 nm Wide Defects in Large Area Nanopatterns Using Optical Interferometric Microscopy-Reference-Cited by-同舟云学术

Detecting 20 nm Wide Defects in Large Area Nanopatterns Using Optical Interferometric Microscopy

Published:2013-08-06 Issue:8 Volume:13 Page:3716-3721
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Zhou Renjie¹,Edwards Chris¹,Arbabi Amir¹,Popescu Gabriel²,Goddard Lynford L.¹

Affiliation:

1. Micro and Nanotechnology Laboratory, Department of Electrical and Computer Engineering, University of Illinois at Urbana−Champaign, Urbana, Illinois 61801, United States

2. Quantitative Light Imaging Laboratory, Department of Electrical and Computer Engineering, Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana−Champaign, Urbana, Illinois 61801, United States

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/nl401622b

Reference41 articles.

1. Atomically flat single-crystalline gold nanostructures for plasmonic nanocircuitry

2. Defects in Individual Semiconducting Single Wall Carbon Nanotubes: Raman Spectroscopic and in Situ Raman Spectroelectrochemical Study

3. Defect-Induced Atomic Migration in Carbon Nanopeapod: Tracking the Single-Atom Dynamic Behavior

4. High-yield self-limiting single-nanowire assembly with dielectrophoresis

5. High Yield, Single Droplet Electrode Arrays for Nanoscale Printed Electronics

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