Plasma-Enhanced Chemical Vapor Deposition of Organosilicon Materials: A Comparison of Hexamethyldisilane and Tetramethylsilane Precursors
Author:
Affiliation:
1. Department of Chemistry, Science Laboratories, University of Durham, Durham DH1 3LE, England
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ma950222v
Reference57 articles.
1. Plasma polymerization of some organic compounds and properties of the polymers
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4. Chemical vapor deposition of silicon carbide from 1,3-disilacyclobutane
5. Amorphous and crystalline phases in PVD coatings after laser treatment
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