1. School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332-0245, United States
2. State Key
Laboratory of Electronic Thin Films and Integrated Devices, School
of Optoelectronic Information, University of Electronic Science and Technology of China (UESTC), Chengdu 610054, China
3. Satellite Laboratory, MANA, National Institute of Materials Science, Tsukuba-city, Ibaraki 305-0047, Japan