Excited Cl(2P1/2) Atoms: Yield from the Photodissociation of SOCl2 and Collisional Deactivation by NO2, CCl3H, C2H4, C3H6, and SOCl2
Author:
Affiliation:
1. Institute of Chemical Kinetics and Combustion, 630090, Novosibirsk, Russia
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp100965c
Reference44 articles.
1. The laser photolysis of ici at 530 nm: a time-resolved lmr study
2. Time-resolved laser magnetic resonance study of deactivation of Cl(2P1/2)
3. Chemical Properties of Electronically Excited Halogen Atoms X(2P1/2) (X=F,Cl,Br,I)
4. Quantum Yields for Cl(2Pj) Atom Formation from the Photolysis of Chlorofluorocarbons and Chlorinated Hydrocarbons at 193.3 nm
5. Photoelectron spectroscopy of ClH2− and ClD2−: A probe of the Cl+H2 van der Waals well and spin–orbit excited states
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Spectroscopic and Kinetic Studies of the ClSO Radical from Cl2SO Photolysis;Journal of the American Chemical Society;2022-10-27
2. Halogen-related photodissociation in atmosphere: characterisation of atomic halogen, molecular halogen, and hydrogen halide;International Reviews in Physical Chemistry;2020-10-09
3. Characterization of molecular channel in photodissociation of SOCl2 at 248 nm: Cl2 probing by cavity ring-down absorption spectroscopy;Physical Chemistry Chemical Physics;2015
4. Molecular halogen elimination from halogen-containing compounds in the atmosphere;Physical Chemistry Chemical Physics;2014
5. Laser magnetic resonance study of the ν2 bending of NO2 using a CO2 laser: Line positions and intensities;Journal of Molecular Spectroscopy;2013-07
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3