Simple and Practical Method for the Quantitative High-Sensitivity Analysis of N-Nitroso Duloxetine in Duloxetine Drug Products Utilizing LC-MS/MS

Author:

Fukuda Shohei1ORCID,Nakase Yumiko2,Imagaki Kazuhide2,Kondo Kanako3,Taniguchi Takahiko4,Uchikawa Osamu4

Affiliation:

1. R&D Division, Analytical Technology Unit, API Analytical Development Department, Towa Pharmaceutical Co., Ltd., 7-1-3 Doi-cho, Amagasaki, Hyogo 660-0083, Japan

2. R&D Division, Analytical Technology Unit, API Analytical Development Department, Towa Pharmaceutical Co., Ltd., 32-8 Kuwazaishinmachi, Kadoma, Osaka 571-0043, Japan

3. R&D Division, Analytical Technology Unit, API Analytical Development Department, Towa Pharmaceutical Co., Ltd., 26-7 Ichiban-cho, Kadoma, Osaka 571-0033, Japan

4. Towa Pharmaceutical Co., Ltd., 2-11 Shinbashi-cho, Kadoma, Osaka 571-8580, Japan

Publisher

American Chemical Society (ACS)

Reference16 articles.

1. Short commentary on NDMA (N-nitrosodimethylamine) contamination of valsartan products

2. EMA Release. Nitrosamine Impurities in Human Medicinal Products 2020 https://www.ema.europa.eu/en/documents/referral/nitrosamines-emea-h-a53-1490-assessment-report_en.pdf (accessed January 30, 2024).

3. FDA Release. Guidance for Industry. Control of Nitrosamine Impurities in Human Drugs 2021 https://www.fda.gov/media/141720/download (accessed January 30, 2024).

4. PMDA Release. Self-Inspection on Risks of Contamination with Nitrosamines in Drugs 2021 https://www.pmda.go.jp/files/000243438.pdf (accessed January 30, 2024).

5. A genome-wide portrait of pervasive drug contaminants

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