Photochemical Fragmentation of Irgacure PAG 103
Author:
Affiliation:
1. Department of Chemistry, University of Aberdeen, Meston Walk, Aberdeen, Scotland AB24 3UE, U.K.
Publisher
American Chemical Society (ACS)
Subject
General Chemical Engineering,General Chemistry
Link
http://pubs.acs.org/doi/pdf/10.1021/acsomega.9b02621
Reference43 articles.
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3. Ito, H.; Willson, C. G. Chemical amplification in the design of dry developing resist materials. Technical Papers of SPE Regional Technical Conference on Photopolymers, 1982; pp 331–353.
4. Chemical amplification in the design of dry developing resist materials
5. Ito, H.; Willson, C. G. Polymers in Electronics; Davidson, T., Ed. ACS Symposium Series 242; American Chemical Society: Washington, D.C, 1984; pp 11–23.
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