Fabrication of Nanocrystalline Silicon Thin Films Utilized for Optoelectronic Devices Prepared by Thermal Vacuum Evaporation-Reference-Cited by-同舟云学术

Fabrication of Nanocrystalline Silicon Thin Films Utilized for Optoelectronic Devices Prepared by Thermal Vacuum Evaporation

Published:2020-10-16 Issue:42 Volume:5 Page:27633-27644
ISSN:2470-1343
Container-title:ACS Omega
language:en
Short-container-title:ACS Omega

Author:

Abo Ghazala Magdy S.¹,Othman Hosam A.¹,Sharaf El-Deen Lobna M.¹,Nawwar Mohamed A.¹^ORCID,Kashyout Abd El-hady B.²

Affiliation:

1. Physics Department, Faculty of Science, Menoufia University, Shebin El-Kom, Menoufia 32511, Egypt

2. Electronic Materials Department, Advanced Technology and New Materials Research Institute, City of Scientific Research and Technological Applications (SRTA-City), New Borg El-Arab City, Alexandria 21934, Egypt

Publisher

American Chemical Society (ACS)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.acs.org/doi/pdf/10.1021/acsomega.0c04206

Reference61 articles.

1. Materials for Photovoltaics: State of Art and Recent Developments

2. Laser Processing of Polysilicon Thin-Film Transistors: Grain Growth and Device Fabrication

3. Polycrystalline silicon thin films by aluminum induced crystallization of amorphous silicon

4. On the Controlling Mechanism of Preferential Orientation of Polycrystalline-Silicon Thin Films Grown by Aluminum-Induced Crystallization

5. In-situ X-ray Diffraction study of Metal Induced Crystallization of amorphous silicon

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