Tuning Electrochemical Bistability by Surface Area Blocking in the Cathodic Deposition of Copper-Reference-Cited by-同舟云学术

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Tuning Electrochemical Bistability by Surface Area Blocking in the Cathodic Deposition of Copper

Published:2018-10-19 Issue:10 Volume:3 Page:13636-13646
ISSN:2470-1343
Container-title:ACS Omega
language:en
Short-container-title:ACS Omega

Author:

Rospendowiski Júlia¹,Pinto Maria R.¹,Hessel Cristian²,Sitta Elton²³^ORCID,Nagao Raphael¹³^ORCID

Affiliation:

1. Institute of Chemistry, University of Campinas, CEP 13083-970 Campinas, Sao Paulo, Brazil

2. Department of Chemistry, Federal University of Sao Carlos, CEP 13565-905 Sao Carlos, Sao Paulo, Brazil

3. Center for Innovation on New Energies, University of Campinas, CEP 13083-841 Campinas, Sao Paulo, Brazil

Funder

Fundação de Amparo à Pesquisa do Estado de São Paulo

Coordenação de Aperfeiçoamento de Pessoal de Nível Superior

Publisher

American Chemical Society (ACS)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.acs.org/doi/pdf/10.1021/acsomega.8b02353

Reference80 articles.

1. An Introduction to Nonlinear Chemical Dynamics

2. The smallest chemical reaction system with bistability

3. Origami structures with a critical transition to bistability arising from hidden degrees of freedom

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