Preparation and Properties of Organic–Inorganic Hybrid Antireflection Films Made by a Low-Temperature Process Using Hollow Silica Nanoparticles
Author:
Affiliation:
1. Institute of Industrial Nanomaterials, Kumamoto University, 2-39-1 Kurokami, Chuo-ku, Kumamoto 860-8555, Japan
2. Fine Chemicals Research Center, JGC Catalysts and Chemicals Ltd., 13-2, Kitaminato-machi, Wakamatsu-ku, Kitakyushu 808-0027, Japan
Funder
Institute of Industrial Nanomaterials, Kumamoto University
JGC Catalysts and Chemicals Ltd.
Publisher
American Chemical Society (ACS)
Subject
General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acsomega.1c00386
Reference30 articles.
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4. Surfactant-assisted selective etching strategy for generation of rattle-like mesoporous silica nanoparticles
5. Hollow organosilica nanospheres prepared through surface hydrophobic layer protected selective etching
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