Oxidation Resistance Improvement of Graphene-Oxide-Semiconductor Planar-Type Electron Sources Using h-BN as an Oxygen-Resistant, Electron-Transmissive Coating-Reference-Cited by-同舟云学术

Oxidation Resistance Improvement of Graphene-Oxide-Semiconductor Planar-Type Electron Sources Using h-BN as an Oxygen-Resistant, Electron-Transmissive Coating

Published:2022-09-06 Issue:37 Volume:7 Page:33004-33009
ISSN:2470-1343
Container-title:ACS Omega
language:en
Short-container-title:ACS Omega

Author:

Matsumoto Naoyuki¹²,Takao Yoshinori³,Nagao Masayoshi²,Murakami Katsuhisa²^ORCID

Affiliation:

1. Department of Mechanical Engineering, Materials Science, and Ocean Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan

2. National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba 305-8568, Ibaraki, Japan

3. Division of Systems Research, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan

Funder

Japan Society for the Promotion of Science

Publisher

American Chemical Society (ACS)

Subject

General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acsomega.2c02709

Reference23 articles.

1. Fluctuation-Free Electron Emission from Non-Formed Metal-Insulator-Metal (MIM) Cathodes Fabricated by Low Current Anodic Oxidation

2. Improvement of emission efficiency of nanocrystalline silicon planar cathodes

3. Emission characteristics of metal–oxide–semiconductor electron tunneling cathode

4. Emission characteristics of nanocrystalline porous silicon ballistic cold cathode in atmospheric ambience

5. Operation of nanosilicon ballistic electron emitter in liquid water and hydrogen generation effect

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2. Development of planar type electron emission devices using a heterostructure of two-dimensional materials;2023 30th International Symposium on Discharges and Electrical Insulation in Vacuum (ISDEIV);2023-06-25

3. Low-Temperature Direct Synthesis of Multilayered h-BN without Catalysts by Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition;ACS Omega;2023-01-31