Decomposing Mechanism of SF6 under Positive DC Partial Discharge in the Presence of Trace H2O
Author:
Affiliation:
1. Chongqing Industry Polytechnic College, Chongqing 401120, China
2. State Key Laboratory of Power Transmission Equipment & System Security and New Technology, Chongqing University, Chongqing 400044, China
Funder
Natural Science Foundation of Chongqing
Publisher
American Chemical Society (ACS)
Subject
General Chemical Engineering,General Chemistry
Link
http://pubs.acs.org/doi/pdf/10.1021/acsomega.0c01591
Reference32 articles.
1. Adsorption and sensing behaviors of SF6 decomposed species on Ni-doped C3N monolayer: A first-principles study
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4. Ru-InN Monolayer as a Gas Scavenger to Guard the Operation Status of SF6 Insulation Devices: A First-Principles Theory
5. A DFT study of dissolved gas (C2H2, H2, CH4) detection in oil on CuO-modified BNNT
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