Novel ALD Process for Depositing CaF2 Thin Films-Reference-Cited by-同舟云学术

Novel ALD Process for Depositing CaF2 Thin Films

Published:2007-05-27 Issue:14 Volume:19 Page:3387-3392
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Pilvi Tero¹,Arstila Kai¹,Leskelä Markku¹,Ritala Mikko¹

Affiliation:

1. Laboratory of Inorganic Chemistry, P.O. Box 55, and Accelerator Laboratory, P.O. Box 43, University of Helsinki, FIN-00014 University of Helsinki, Finland

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm0629412

Reference68 articles.

1. MBE-growth peculiarities of fluoride (CdF2–CaF2) thin film structures

2. The great improvement of surface smoothness of CaF2 in pulsed laser deposition even under the two-photon absorption process

3. Atomic force microscopy study of the CaF2(111) surface: from cleavage via island to evaporation topographies

4. Metal Fluoride Thin Films Prepared by Atomic Layer Deposition

5. Ion-assisted codeposition of CaF_2-rich CaF_2–TiO_2 composites as infrared-transmitting films

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