Generation of Weakly Bound Al–N Lewis Pairs by Hydroalumination of Ynamines and the Activation of Small Molecules: Phenylethyne and Dicyclohexylcarbodiimide
Author:
Affiliation:
1. Organisch-Chemisches Institut der Universität Münster, Corrensstraße 40, D-48149 Münster, Germany
2. Institut für Anorganische und Analytische Chemie der Universität Münster, Corrensstraße 30, D-48149 Münster, Germany
Publisher
American Chemical Society (ACS)
Subject
Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/om3001179
Reference117 articles.
1. Neue Einblicke in den Mechanismus der Diwasserstoff-Aktivierung durch frustrierte Lewis-Paare
2. Angew. Chem., Int. Ed. 2010, 49, 1402–1405.
3. Dihydrogen Activation by B(p-C6F4H)3 and Phosphines
4. Rationalizing the Reactivity of Frustrated Lewis Pairs: Thermodynamics of H2 Activation and the Role of Acid−Base Properties
5. Activation of Terminal Alkynes by Frustrated Lewis Pairs
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