Soft-UV Photolithography using Self-Assembled Monolayers-Reference-Cited by-同舟云学术

Soft-UV Photolithography using Self-Assembled Monolayers

Published:2006-08-01 Issue:34 Volume:110 Page:17167-17174
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Critchley Kevin¹,Zhang Lixin¹,Fukushima Hitoshi¹,Ishida Masaya¹,Shimoda Tatsuya¹,Bushby Richard J.¹,Evans Stephen D.¹

Affiliation:

1. School of Physics and Astronomy, University of Leeds, Leeds LS2 9JT, UK, Self-Organizing Molecular Systems (SOMS) Centre, University of Leeds, Leeds LS2 9JT, UK, I/O group/Technology Platform Research CentreSeiko Epson Corporation, Fujimi Plant: 281 Fujimi, Fujimi-machi, Suwa-gun, Nagano-ken 399-0293, Japan, and Cambridge Research Laboratory of Epson, 9A Science Park, Milton Rd, Cambridge CB4 0FE, UK

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp0630370

Reference56 articles.

1. Deep UV Photochemistry of Chemisorbed Monolayers: Patterned Coplanar Molecular Assemblies

2. Deep ultraviolet patterning of monolayer films for high resolution lithography

3. Patterning of Self-Assembled Films Using Lithographic Exposure Tools

4. Photopatterning of Self-Assembled Alkanethiolate Monolayers on Gold: A Simple Monolayer Photoresist Utilizing Aqueous Chemistry

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