Theoretical Studies on the Decomposition Mechanism of Tetraalkyl Titanium Complexes-Reference-Cited by-同舟云学术

Theoretical Studies on the Decomposition Mechanism of Tetraalkyl Titanium Complexes

Published:1996-01-01 Issue:40 Volume:118 Page:9772-9777
ISSN:0002-7863
Container-title:Journal of the American Chemical Society
language:en
Short-container-title:J. Am. Chem. Soc.

Author:

Wu Yun-Dong¹,Peng Zhi-Hui¹,Xue Ziling¹

Affiliation:

1. Contribution from the Department of Chemistry, The Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong, and Department of Chemistry, University of Tennessee, Knoxville, Tennessee 37996-1600

Publisher

American Chemical Society (ACS)

Subject

Colloid and Surface Chemistry,Biochemistry,General Chemistry,Catalysis

Link

https://pubs.acs.org/doi/pdf/10.1021/ja9615132

Reference61 articles.

1. Growth of Group III Nitrides. A Review of Precursors and Techniques

2. Reaction pathways in organometallic chemical vapor deposition(OMCVD)

3. Indium tert-butylthiolates as single source precursors for indium sulfide thin films: Is molecular design enough?

4. Organometallic molecular precursors for low-temperature MOCVD of III-V semiconductors

5. Organometallic route to the chemical vapor deposition of titanium carbide films at exceptionally low temperatures

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