Novel Titanium Compounds for Metal−Organic Chemical Vapor Deposition of Titanium Dioxide Films with an Ultrahigh Deposition Rate-Reference-Cited by-同舟云学术

Novel Titanium Compounds for Metal−Organic Chemical Vapor Deposition of Titanium Dioxide Films with an Ultrahigh Deposition Rate

Published:2003-02-20 Issue:7 Volume:42 Page:2378-2383
ISSN:0020-1669
Container-title:Inorganic Chemistry
language:en
Short-container-title:Inorg. Chem.

Author:

Woo Kyoungja¹,Lee Wan In¹,Lee Jong Seung¹,Kang Sang Ook¹

Affiliation:

1. Nano-Materials Research Center, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul 130-650, Korea, Department of Chemistry, Inha University, Inchon 402-752, Korea, and Department of Chemistry, Korea University, 208 Seochang, Chochiwon, Chung-nam 339-700, Korea

Publisher

American Chemical Society (ACS)

Subject

Inorganic Chemistry,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ic0256967

Reference24 articles.

1. MOSFET transistors fabricated with high permitivity TiO/sub 2/ dielectrics

2. Memory applications based on ferroelectric and high-permittivity dielectric thin films

3. Metalorganic Chemical Vapor Deposition of Ferroelectric Pb(Zr,Ti)O3 Thin Films

4. Enhancement of the dielectric constant of Ta2O5through substitution with TiO2

5. CVD of Nonmetals

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