Intramolecular Aryl Migration from Tin to Carbon via a Radical Atom-Transfer Process
Author:
Affiliation:
1. Department of Material Chemistry, Graduate School of Engineering, Kyoto University, Kyoto 606-8501, Japan
Publisher
American Chemical Society (ACS)
Subject
Organic Chemistry,Physical and Theoretical Chemistry,Biochemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ol005971y
Reference31 articles.
1. Radical ipso attack and ipso substitution in aromatic compounds
2. Search for radical rearrangement in organosilicon systems. II. Silicon to carbon Ar1-5 and Ar1-6 phenyl shifts
3. Halogen leaving group effect in the reductive rearrangement of .gamma.-silyl halides with tri-n-butyltin hydride
4. Aryl shifts from silicon to carbon via .gamma.- and .delta.-silyl radicals
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