Synthesis, Composition, and Electronic Structure of Cr−Si−N Thin Films Formed by Reactive Ion Beam Mixing of Cr/Si Interfaces
Author:
Affiliation:
1. Departamento de Física Aplicada, Facultad de Ciencias, C-XII, Universidad Autónoma de Madrid, Cantoblanco, 28049-Madrid, Spain
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/jp0751615
Reference32 articles.
1. Electronic structure and mechanical properties of resistant coatings: The chromium molybdenum nitride system
2. Characterization of (Cr,Ta)N hard coatings reactively sputtered at low temperature
3. Electronic structure and mechanical properties of hard coatings from the chromium–tungsten nitride system
4. Physical and mechanical properties of chromium zirconium nitride thin films
5. Electronic properties of Cr1−xAlxN thin films deposited by reactive magnetron sputtering
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