Thermal Chemistry of CH3 on Si/Cu(100)-Reference-Cited by-同舟云学术

Thermal Chemistry of CH3 on Si/Cu(100)

Published:2000-01-07 Issue:14 Volume:104 Page:3078-3084
ISSN:1520-6106
Container-title:The Journal of Physical Chemistry B
language:en
Short-container-title:J. Phys. Chem. B

Author:

Han J.¹,Gheyas S. I.¹,Wang Y.¹,Strongin D. R.¹,Graham A. P.¹,Hinch B. J.¹,Wright A. P.¹

Affiliation:

1. Department of Chemistry, Temple University, Philadelphia, Pennsylvania 19122, Department of Chemistry, Rutgers University, Piscataway, New Jersey 08855, and Dow Corning Corporation, Midland, Michigan 48686-0995

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/jp9928863

Reference21 articles.

1. The Direct Synthesis of Organosilicon Compounds

2. Voorhoeve, R. J. H.Organohalosilanes: Precursors to Silicones; Elsevier: Amsterdam, 1967.

3. Catalysis of the Rochow Direct Process

4. The Significance of Si and Zn Surface Enrichment in the Rochow Reaction

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