Eley−Rideal Dynamics of the Chlorine Atom Abstraction of Hydrogen Chemisorbed on Silicon
Author:
Affiliation:
1. Department of Chemistry,‡ University of Nevada, Reno, Nevada 89557
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp982927f
Reference45 articles.
1. Electron‐induced chemical vapor deposition by reactions induced in adsorbed molecular layers
2. Atomic hydrogen-driven halogen extraction from silicon(100): Eley-Rideal surface kinetics
3. Halogen surface chemistry on Si(100)−(2×1)
4. Atomic H abstraction of surface H on Si: An Eley–Rideal mechanism?
5. Surface Chemistry of Silicon
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