Photocurable Silsesquioxane-Based Formulations as Versatile Resins for Nanoimprint Lithography-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Photocurable Silsesquioxane-Based Formulations as Versatile Resins for Nanoimprint Lithography

Published:2010-08-23 Issue:18 Volume:26 Page:14915-14922
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Lee Bong Kuk¹²,Cha Nam-Goo¹,Hong Lan-Young³,Kim Dong-Pyo³,Tanaka Hidekazu¹,Lee Hea Yeon¹⁴,Kawai Tomoji¹⁴

Affiliation:

1. The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan

2. Bionanotechnology Research Center, Korea Research Institute of Bioscience & Biotechnology, 111 Gwahangno, Yuseong-gu, Daejeon 305-806, Korea

3. Department of Fine Chemical Engineering and Chemistry, 220 Kung-dong, Yusung-gu, Daejeon 305-764, Korea

4. Division of Quantum Phases & Devices, School of Physics, Konkuk University, Seoul 143-701, Korea

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la1025119

Reference57 articles.

1. From Micro- to Nanofabrication with Soft Materials

2. Optics in the Nano-World

3. New Approaches to Nanofabrication: Molding, Printing, and Other Techniques

4. Soft Lithography

5. Unconventional Methods for Fabricating and Patterning Nanostructures

Cited by 35 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems;Polymers;2024-03-19

2. Mitigating Shrinkage Stress in UV-Curable Resin: Shape Memory Microcapsules Enable Shrinkage Stress Reduction via Photopolymerization-Induced Shape Recovery;ACS Applied Polymer Materials;2024-01-03

3. An overview of photopolymerization and its diverse applications;Applied Research;2023-09-19

4. A comprehensive investigation of acrylates photopolymerization shrinkage stress from micro and macro perspectives by real time MIR-photo-rheology;Progress in Organic Coatings;2021-06

5. POSS—Thermosetting polymer nanocomposites;Polyhedral Oligomeric Silsesquioxane (POSS) Polymer Nanocomposites;2021

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3