Regarding the Influence of Additives and Additional Plasma-Induced Chemical Ionization on Adduct Formation in ESI/IMS/MS-Reference-Cited by-同舟云学术

Regarding the Influence of Additives and Additional Plasma-Induced Chemical Ionization on Adduct Formation in ESI/IMS/MS

Published:2023-04-13 Issue:5 Volume:34 Page:857-868
ISSN:1044-0305
Container-title:Journal of the American Society for Mass Spectrometry
language:en
Short-container-title:J. Am. Soc. Mass Spectrom.

Author:

Thoben Christian¹^ORCID,Hartner Nora T.²^ORCID,Hitzemann Moritz¹^ORCID,Raddatz Christian-Robert¹^ORCID,Eckermann Manuel¹,Belder Detlev²^ORCID,Zimmermann Stefan¹^ORCID

Affiliation:

1. Leibniz University Hannover, Institute of Electrical Engineering and Measurement Technology, Department of Sensors and Measurement Technology, Appelstr. 9A, 30167 Hannover, Germany

2. Leipzig University, Institute of Analytical Chemistry, Linnéstraße 3, 04103 Leipzig, Germany

Funder

Deutsche Forschungsgemeinschaft

Publisher

American Chemical Society (ACS)

Subject

Spectroscopy,Structural Biology

Link

https://pubs.acs.org/doi/pdf/10.1021/jasms.2c00348

Reference58 articles.

1. Practical implications of some recent studies in electrospray ionization fundamentals

2. Selectivity in Electrospray Ionization Mass Spectrometry

3. Mechanistic aspects of electrospray ionization

4. Electrospray as a Controlled-Current Electrolytic Cell: Electrochemical Ionization of Neutral Analytes for Detection by Electrospray Mass Spectrometry

5. Using the Electrochemistry of the Electrospray Ion Source

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