Directed Self-Assembly of Diblock Copolymer Thin Films on Chemically-Patterned Substrates for Defect-Free Nano-Patterning-Reference-Cited by-同舟云学术

Directed Self-Assembly of Diblock Copolymer Thin Films on Chemically-Patterned Substrates for Defect-Free Nano-Patterning

Published:2008-11-04 Issue:23 Volume:41 Page:9267-9276
ISSN:0024-9297
Container-title:Macromolecules
language:en
Short-container-title:Macromolecules

Author:

Tada Yasuhiko¹,Akasaka Satoshi¹,Yoshida Hiroshi¹,Hasegawa Hirokazu¹,Dobisz Elizabeth¹,Kercher Dan¹,Takenaka Mikihito¹

Affiliation:

1. Materials Research Laboratory, Hitachi Ltd., Hitachi, Ibaraki 319-1292, Japan, Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University, Nishikyo-ku, Kyoto 615-8510, Japan, and San Jose Research Center, Hitachi Global Storage Technologies, 3403 Yerba Buena Road, San Jose, California 95135

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ma801542y

Reference36 articles.

1. Nanofabricated and self-assembled magnetic structures as data storage media

2. Radiolysis and resolution limits of inorganic halide resists

3. Challenges in 1 Teradot∕in.[sup 2] dot patterning using electron beam lithography for bit-patterned media

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