Restacking-Inhibited 3D Reduced Graphene Oxide for High Performance Supercapacitor Electrodes

Author:

Lee Ji Hoon1,Park Nokyoung2,Kim Byung Gon1,Jung Dae Soo1,Im Kyuhyun2,Hur Jaehyun2,Choi Jang Wook13

Affiliation:

1. Graduate School of EEWS (WCU), Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong Gu, Daejeon 305-701, Republic of Korea

2. Frontier Research Laboratory, Samsung Advanced Institute of Technology, Samsung Electronics, Yongin, Kyunggi-do 446-712, Republic of Korea

3. KAIST Institute Nano Century, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong Gu, Daejeon, 305-701, Republic of Korea

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

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